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Stable organic static random access memory from a roll-to-roll compatible vacuum evaporation process

Abstract:
An organic Static Random Access Memory (SRAM) based on p-type, six-transistor cells is demonstrated. The bottom-gate top-contact thin film transistors composing the memory were fabricated on flexible polyethylene naphthalate substrates. All metallization layers and the p-type semiconductor dinaphtho[2,3-b:2',3'-f] thieno[3,2-b]thiophene were deposited by thermal evaporation. The gate dielectric was deposited in a vacuum roll-to-roll environment at a web speed of 25 m/min by flash-evaporation and subsequent plasma polymerisation of tripropyleneglycol diacrylate (TPGDA). Buffering the TPGDA with a polystyrene layer yields hysteresis-free transistor characteristics with turn-on voltage close to zero. The static transfer characteristic of diode-connected load inverters were also hysteresis-free with maximum gain >2 and noise margin ∼2.5 V. When incorporated into SRAM cells the time-constant for writing data into individual SRAM cells was less than 0.4 ms. Little change occurred in the magnitude of the stored voltages, when the SRAM was powered continuously from a −40 V rail for over 27 h testifying to the electrical stability of the threshold voltage of the individual transistors. Unencapsulated SRAM cells measured two months after fabrication showed no significant degradation after storage in a clear plastic container in normal laboratory ambient.
Publication status:
Published
Peer review status:
Peer reviewed

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Publisher copy:
10.1016/j.orgel.2016.01.017

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Institution:
University of Oxford
Division:
MPLS
Department:
Materials
Role:
Author


Publisher:
Elsevier
Journal:
Organic Electronics More from this journal
Volume:
31
Pages:
77-81
Publication date:
2016-01-20
DOI:
ISSN:
1566-1199


Keywords:
Pubs id:
pubs:596432
UUID:
uuid:026ddd51-ca93-4d1d-8dee-dfc44c76d489
Local pid:
pubs:596432
Source identifiers:
596432
Deposit date:
2016-01-22

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