Journal article

EFFECTS OF HIGH UNIAXIAL STRESS ON FAR INFRA-RED IMPURITY SPECTRA OF HIGH-PURITY NORMAL-TYPE AND PARA-TYPE SILICON

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APA Style

Cooke, R., Nicholas, R., Stradling, R., Portal, J., & Askenazy, S. (1978). EFFECTS OF HIGH UNIAXIAL STRESS ON FAR INFRA-RED IMPURITY SPECTRA OF HIGH-PURITY NORMAL-TYPE AND PARA-TYPE SILICON. SOLID STATE COMMUNICATIONS, 26(1), 11–15.

MLA Style

Cooke, R, et al. “EFFECTS OF HIGH UNIAXIAL STRESS ON FAR INFRA-RED IMPURITY SPECTRA OF HIGH-PURITY NORMAL-TYPE AND PARA-TYPE SILICON.” SOLID STATE COMMUNICATIONS, vol. 26, no. 1, 1978, pp. 11–15.

Chicago Style

Cooke, R, R Nicholas, R Stradling, J Portal, and S Askenazy. 1978. “EFFECTS OF HIGH UNIAXIAL STRESS ON FAR INFRA-RED IMPURITY SPECTRA OF HIGH-PURITY NORMAL-TYPE AND PARA-TYPE SILICON.” SOLID STATE COMMUNICATIONS 26 (1): 11–15.
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Publisher copy:: 10.1016/0038-1098(78)90997-3

Authors

+ Cooke, R More by this author

Role:: Author

+ Nicholas, R More by this author

Role:: Author

+ Stradling, R More by this author

Role:: Author

+ Portal, J More by this author

Role:: Author

+ Askenazy, S More by this author

Role:: Author

Journal:: SOLID STATE COMMUNICATIONS More from this journal
Volume:: 26
Issue:: 1
Pages:: 11-15
Publication date:: 1978-01-01
DOI:: 10.1016/0038-1098(78)90997-3
ISSN:: 0038-1098

Pubs id:: pubs:26995
UUID:: uuid:f7bc27da-2d6e-458a-bc60-28219564690d
Local pid:: pubs:26995
Source identifiers:: 26995
Deposit date:: 2012-12-19
ARK identifier:: ark:/29072/ora_f7bc27da2d6e458abc6028219564690d

Terms of use

Copyright date:: 1978

Licence:: Terms and Conditions of Use for Oxford University Research Archive

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