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Carbon nanotube nanoelectronic devices compatible with transmission electron microscopy.

Abstract:

We report on a novel method to fabricate carbon nanotube (CNT) nanoelectronic devices on silicon nitride membrane grids that are compatible with high resolution transmission electron microscopy (HRTEM). Resist-based electron beam lithography is used to fabricate electrodes on 50 nm thin silicon nitride membranes and focused-ion-beam milling is used to cut out a 200 nm gap across a gold electrode to produce the viewing window for HRTEM. Spin-coating and AC electrophoresis are used as methods t...

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Publication status:
Published

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Institution:
University of Oxford
Division:
MPLS
Department:
Materials
Role:
Author
Journal:
Nanotechnology More from this journal
Volume:
22
Issue:
24
Pages:
245305
Publication date:
2011-06-01
DOI:
EISSN:
1361-6528
ISSN:
0957-4484
Language:
English
Pubs id:
pubs:134978
UUID:
uuid:f6c55228-f484-43cf-8a5f-90d54cb883bb
Local pid:
pubs:134978
Source identifiers:
134978
Deposit date:
2012-12-19

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