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Rapid patterning of single-wall carbon nanotubes by interlayer lithography.

Abstract:
High resolution patterning of single-wall carbon nanotubes is achieved using interlayer lithography. Minimum feature sizes of 6 and 0.7 μm are demonstrated on glass and silicon, using the negative photoresist SU-8 and the positive photoresist AZ7220, respectively. Films patterned using SU-8 have a good balance of transparency and sheet-resistance, and are shown to be effective electrodes for organic solar cells. Copyright © 2010 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim.

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Publisher copy:
10.1002/smll.201000971

Authors


Edwards, A More by this author
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Journal:
Small (Weinheim an der Bergstrasse, Germany)
Volume:
6
Issue:
22
Pages:
2530-2534
Publication date:
2010-11-05
DOI:
EISSN:
1613-6829
ISSN:
1613-6810
URN:
uuid:eaa0bccf-3182-4b0b-8941-677e07a9693b
Source identifiers:
389039
Local pid:
pubs:389039

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