Journal article

Rapid patterning of single-wall carbon nanotubes by interlayer lithography.

Abstract:: High resolution patterning of single-wall carbon nanotubes is achieved using interlayer lithography. Minimum feature sizes of 6 and 0.7 μm are demonstrated on glass and silicon, using the negative photoresist SU-8 and the positive photoresist AZ7220, respectively. Films patterned using SU-8 have a good balance of transparency and sheet-resistance, and are shown to be effective electrodes for organic solar cells. Copyright © 2010 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim.

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APA Style

Leem, D., Kim, S., Kim, J., Sohn, J., Edwards, A., Huang, J., Wang, X., Kim, J., Bradley, D., & Demello, J. (2010). Rapid patterning of single-wall carbon nanotubes by interlayer lithography. Small (Weinheim an Der Bergstrasse, Germany), 6(22), 2530–2534.

MLA Style

Leem, D, et al. “Rapid Patterning of Single-Wall Carbon Nanotubes by Interlayer Lithography.” Small (Weinheim an Der Bergstrasse, Germany), vol. 6, no. 22, 2010, pp. 2530–34.

Chicago Style

Leem, D, S Kim, J Kim, et al. 2010. “Rapid Patterning of Single-Wall Carbon Nanotubes by Interlayer Lithography.” Small (Weinheim an Der Bergstrasse, Germany) 6 (22): 2530–34.
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Publisher copy:: 10.1002/smll.201000971

Authors

+ Leem, D More by this author

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+ Kim, S More by this author

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+ Kim, J More by this author

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+ Sohn, J More by this author

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+ Edwards, A More by this author

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Journal:: Small (Weinheim an der Bergstrasse, Germany) More from this journal
Volume:: 6
Issue:: 22
Pages:: 2530-2534
Publication date:: 2010-11-01
DOI:: 10.1002/smll.201000971
EISSN:: 1613-6829
ISSN:: 1613-6810

Language:: English
Keywords:: Nanotechnology

Microscopy, Electron, Scanning

Nanotubes, Carbon
Pubs id:: pubs:389039
UUID:: uuid:eaa0bccf-3182-4b0b-8941-677e07a9693b
Local pid:: pubs:389039
Source identifiers:: 389039
Deposit date:: 2013-11-16
ARK identifier:: ark:/29072/ora_eaa0bccf31824b0b8941677e07a9693b

Terms of use

Copyright date:: 2010

Licence:: Terms and Conditions of Use for Oxford University Research Archive

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