APPLICATION OF TRANSMISSION ION CHANNELING TO THE IMAGING OF STACKING-FAULTS

Conference item

The Nuclear Microprobe at the University of Oxford has been employed to produce images of crystal defects using transmission ion channeling This paper describes the experimental set-up for the technique and shows how images of stacking faults near the surface of a 40 mu m thick silicon crystal can be generated, The invisibility of faults for certain planar channeling directions produces information on the nature of these defects. For the faults that are visible, the choice of channeling direction affects the image contrast. It is estimated that faults at least 10 mu m below the surface of the sample would be detectable for the analysing beam of 3 MeV protons.

Authors: King, P; Breese, M; Wilshaw, P; Grime, G

• Publication status: Published
• Journal: NUCLEAR INSTRUMENTS and METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
• Volume: 104
• Issue: 1-4
• Pages: 233-237
• Publication date: 1995-09-01
• Event title: 4th International Conference on Nuclear Microprobe Technology and Applications
• DOI: 10.1016/0168-583X(95)00449-1
• ISSN: 0168-583X
• Keywords: MICROSCOPY