Journal article

ADSORPTION, ETCHING AND PHOTOINDUCED REACTIONS AT THE SI(100)-CCL4 INTERFACE

Publication status:: Published

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APA Style

French, C., Jackman, R., Price, R., & Foord, J. (1989). ADSORPTION, ETCHING AND PHOTOINDUCED REACTIONS AT THE SI(100)-CCL4 INTERFACE. JOURNAL OF PHYSICS-CONDENSED MATTER, 1, SB181–SB182.

MLA Style

French, C, et al. “ADSORPTION, ETCHING AND PHOTOINDUCED REACTIONS AT THE SI(100)-CCL4 INTERFACE.” JOURNAL OF PHYSICS-CONDENSED MATTER, vol. 1, 1989, pp. SB181–SB182.

Chicago Style

French, C, R Jackman, R Price, and J Foord. 1989. “ADSORPTION, ETCHING AND PHOTOINDUCED REACTIONS AT THE SI(100)-CCL4 INTERFACE.” JOURNAL OF PHYSICS-CONDENSED MATTER 1: SB181–SB182.
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Authors

+ French, C More by this author

Role:: Author

+ Jackman, R More by this author

Role:: Author

+ Price, R More by this author

Role:: Author

+ Foord, J More by this author

Role:: Author

Journal:: JOURNAL OF PHYSICS-CONDENSED MATTER More from this journal
Volume:: 1
Pages:: SB181-SB182
Publication date:: 1989-10-01
ISSN:: 0953-8984

Pubs id:: pubs:43148
UUID:: uuid:e8d8902d-2b5f-4a0c-bb57-bc0aa0551f61
Local pid:: pubs:43148
Source identifiers:: 43148
Deposit date:: 2012-12-19
ARK identifier:: ark:/29072/ora_e8d8902d2b5f4a0cbb57bc0aa0551f61

Terms of use

Copyright date:: 1989

Licence:: Terms and Conditions of Use for Oxford University Research Archive

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