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Oligomeric aminoborane precursors for the chemical vapour deposition growth of few-layer hexagonal boron nitride

Abstract:

We explore the use of stable, pre-formed, oligomeric aminoboranes as precursors for the chemical vapour deposition growth of few-layered hexagonal boron nitride (h-BN) films on Cu foils under atmospheric pressure conditions. Dimeric diborazane H3B·NH2BH2·NH3 (DAB), and trimeric triborazane H3B·(NH2BH2)2·NH3 (TAB), derivatives of ammonia borane, H3B·NH3 (AB), are compared with AB, a commonly used precursor for the CVD growth of h-BN. Both DAB and TAB show similar effectiveness to AB in growing...

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Publication status:
Published
Peer review status:
Peer reviewed

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Publisher copy:
10.1039/c6ce02006b

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Institution:
University of Oxford
Division:
MPLS
Department:
Materials
Role:
Author
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Institution:
University of Oxford
Division:
MPLS
Department:
Chemistry
Sub department:
Inorganic Chemistry
Role:
Author
More by this author
Institution:
University of Oxford
Division:
MPLS
Department:
Chemistry
Sub department:
Inorganic Chemistry
Role:
Author
More by this author
Institution:
University of Oxford
Division:
MPLS
Department:
Chemistry
Sub department:
Inorganic Chemistry
Role:
Author
More by this author
Institution:
University of Oxford
Division:
MPLS
Department:
Materials
Role:
Author
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Rhodes Trust More from this funder
Publisher:
Royal Society of Chemistry Publisher's website
Journal:
CrystEngComm Journal website
Volume:
19
Issue:
2
Pages:
285-294
Publication date:
2016-12-08
Acceptance date:
2016-11-17
DOI:
EISSN:
1466-8033
Source identifiers:
665399
Keywords:
Pubs id:
pubs:665399
UUID:
uuid:e1aa8abb-b896-4640-9932-c04732663724
Local pid:
pubs:665399
Deposit date:
2016-12-13

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