Journal article

Thermal and ion-beam-induced etching of InP with chlorine

Abstract:: Surface spectroscopic techniques have been used to investigate adsorption and thermal and ion-induced processes at the InP(100)-Cl2 interface. Two adsorption states are identified and etching reactions are interpreted in terms of surface chemical transformations and desorption processes involving these states.

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APA Style

Murrell, A., Price, R., Jackman, R., & Foord, J. (1989). Thermal and ion-beam-induced etching of InP with chlorine. Journal of Physics: Condensed Matter, 1(SB), SB179–SB180.

MLA Style

Murrell, A., et al. “Thermal and Ion-Beam-Induced Etching of InP with Chlorine.” Journal of Physics: Condensed Matter, vol. 1, no. SB, 1989, pp. SB179–SB180.

Chicago Style

Murrell, A, R Price, R Jackman, and J Foord. 1989. “Thermal and Ion-Beam-Induced Etching of InP with Chlorine.” Journal of Physics: Condensed Matter 1 (SB): SB179–SB180.
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Publisher copy:: 10.1088/0953-8984/1/SB/031

Authors

+ Murrell, A More by this author

Role:: Author

+ Price, R More by this author

Role:: Author

+ Jackman, R More by this author

Role:: Author

+ Foord, J More by this author

Institution:: University of Oxford
Division:: MPLS
Department:: Chemistry
Sub department:: Physical & Theoretical Chem
Role:: Author

Journal:: Journal of Physics: Condensed Matter More from this journal
Volume:: 1
Issue:: SB
Pages:: SB179-SB180
Publication date:: 1989-01-01
DOI:: 10.1088/0953-8984/1/SB/031
EISSN:: 1361-648X
ISSN:: 0953-8984

Language:: English
Pubs id:: pubs:94398
UUID:: uuid:d5c28039-4ce3-4ffc-a586-2c188e10a678
Local pid:: pubs:94398
Source identifiers:: 94398
Deposit date:: 2012-12-20

Terms of use

Copyright date:: 1989

Licence:: Terms and Conditions of Use for Oxford University Research Archive

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