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Enhancement of light absorption using high-k dielectric in localized surface plasmon resonance for silicon-based thin film solar cells

Abstract:

The application of high-dielectric-constant (k) materials, e.g., Si 3N4, ZrO2, and HfO2, to localized surface plasmon resonance (LSPR) excited by a Au nanoparticle structure has been investigated and simulated for the enhancement of light absorption in Si-based thin film solar cells by using Mie theory and three-dimensional finite-difference time-domain computational simulations. As compared to a conventional SiO2 dielectric spacing layer, the high-k dielectrics have significant advantages, s...

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Publication status:
Published

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Publisher copy:
10.1063/1.3587165

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Journal:
JOURNAL OF APPLIED PHYSICS
Volume:
109
Issue:
9
Pages:
093516-093516
Publication date:
2011-05-01
DOI:
ISSN:
0021-8979
URN:
uuid:d39b8de0-40be-47a2-b75e-95824f9ce91d
Source identifiers:
389083
Local pid:
pubs:389083
Language:
English

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