Journal article
Validity of Vegard’s rule for Al₁₋ₓ Inₓ N (0.08
- Abstract:
- In this work, comparative x-ray diffraction (XRD) and Rutherford backscattering spectrometry (RBS) measurements allow a comprehensive characterization of Al1-xInxN thin films grown on GaN. Within the limits of experimental accuracy, and in the compositional range 0.08 < x < 0.28, the lattice parameters of the alloys generally obey Vegard's rule, varying linearly with the InN fraction. Results are also consistent with the small deviation from linear behaviour suggested by Darakchieva et al (2008 Appl. Phys. Lett. 93 261908). However, unintentional incorporation of Ga, revealed by atom probe tomography (APT) at levels below the detection limit for RBS, may also affect the lattice parameters. Furthermore, in certain samples the compositions determined by XRD and RBS differ significantly. This fact, which was interpreted in earlier publications as an indication of a deviation from Vegard's rule, may rather be ascribed to the influence of defects or impurities on the lattice parameters of the alloy. The wide-ranging set of Al1-xInxN films studied allowed furthermore a detailed investigation of the composition leading to lattice-matching of Al1-xInxN/GaN bilayers.
- Publication status:
- Published
- Peer review status:
- Peer reviewed
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(Preview, Version of record, pdf, 3.0MB, Terms of use)
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- Publisher copy:
- 10.1088/1361-6463/aa69dc
Authors
- Publisher:
- Institute of Physics
- Journal:
- Journal of Physics D: Applied Physics More from this journal
- Volume:
- 50
- Issue:
- 20
- Pages:
- 205107
- Publication date:
- 2017-04-01
- Acceptance date:
- 2017-03-29
- DOI:
- EISSN:
-
1361-6463
- ISSN:
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0022-3727
- Keywords:
- Pubs id:
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pubs:697226
- UUID:
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uuid:d274df2a-431f-4bcd-83e6-bd5354954b01
- Local pid:
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pubs:697226
- Source identifiers:
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697226
- Deposit date:
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2017-05-25
Terms of use
- Copyright holder:
- IOP Publishing Ltd
- Copyright date:
- 2017
- Notes:
- © 2017 IOP Publishing Ltd. Original content from this work may be used under the terms of the Creative Commons Attribution 3.0 licence. Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI.
- Licence:
- CC Attribution (CC BY)
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