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Band offsets at the Si/SiO2 interface from many-body perturbation theory.

Abstract:
We use many-body perturbation theory, the state-of-the-art method for band-gap calculations, to compute the band offsets at the Si/SiO2 interface. We examine the adequacy of the usual approximations in this context. We show that (i) the separate treatment of band structure and potential lineup contributions, the latter being evaluated within density-functional theory, is justified, (ii) most plasmon-pole models lead to inaccuracies in the absolute quasiparticle corrections, (iii) vertex corrections can be neglected, and (iv) eigenenergy self-consistency is adequate. Our theoretical offsets agree with the experimental ones within 0.3 eV.
Publication status:
Published

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Publisher copy:
10.1103/physrevlett.100.186401

Authors

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Institution:
University of Oxford
Division:
MPLS
Department:
Materials
Role:
Author


Journal:
Physical Review Letters More from this journal
Volume:
100
Issue:
18
Pages:
186401
Publication date:
2008-05-01
DOI:
EISSN:
1079-7114
ISSN:
0031-9007


Language:
English
Pubs id:
pubs:172960
UUID:
uuid:cc6bfab4-3616-4f49-a00c-bafc41da9a0d
Local pid:
pubs:172960
Source identifiers:
172960
Deposit date:
2012-12-19
ARK identifier:

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