Journal article
Electrochemical mechanics of metal thin films: charge-induced reversible surface stress for actuation
- Abstract:
- The intrinsic charge‐induced surface stress of Ni thin films during electrochemical reactions with an alkaline electrolyte is measured in situ. Surface stresses induced by H absorption/desorption, α‐Ni(OH)2 formation, capacitive double‐layer charging, the α‐ to β‐Ni(OH)2 transformation, and β‐Ni(OH)2/β‐NiOOH redox reactions are identified, and each provided additive contributions to the overall stress state. Surface stresses are magnified in high‐surface‐area nanoporous Ni because local stress‐relaxation mechanisms are restricted when compared to a smooth Ni film. Ni film reversible tensile/compressive surface stresses correlate with anodic/cathodic potential scanning but with an opposite trend to that of a less reactive Au film. Surface stresses in the Ni films are up to 40 times that of Au films and suggest the possibility of using controlled surface‐stress generation for electrochemical actuation.
- Publication status:
- Published
- Peer review status:
- Peer reviewed
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(Preview, Version of record, 4.7MB, Terms of use)
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- Publisher copy:
- 10.1002/aelm.201900364
Authors
- Publisher:
- Wiley
- Journal:
- Advanced Electronic Materials More from this journal
- Volume:
- 6
- Issue:
- 1
- Article number:
- 1900364
- Publication date:
- 2019-11-18
- Acceptance date:
- 2019-10-27
- DOI:
- EISSN:
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2199-160X
- Language:
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English
- Keywords:
- Pubs id:
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pubs:1075323
- UUID:
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uuid:b6696db1-1114-4f17-ac5b-044eb437a0a7
- Local pid:
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pubs:1075323
- Source identifiers:
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1075323
- Deposit date:
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2019-12-13
Terms of use
- Copyright holder:
- Cheng, C et al.
- Copyright date:
- 2019
- Rights statement:
- © 2019 The Authors. Published by WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim. This is an open access article under the terms of the Creative Commons Attribution License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited.
- Licence:
- CC Attribution (CC BY)
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