Journal article
AFM-based functional tomography - to mill or not to mill, that is the question!
- Abstract:
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The electrical response of ferroelectric domain walls is often influenced by their geometry underneath the sample surface. Tomographic imaging in these material systems has therefore become increasingly important for its ability to correlate the surface-level functional response with subsurface domain microstructure. In this context, AFM-based tomography emerges as a compelling choice because of its simplicity, high resolution, and robust contrast mechanism. However, to date, the technique has been implemented in a limited number of ferroelectric materials, typically to depths of a few hundred nanometers or on relatively soft materials, resulting in an unclear understanding of its capabilities and limitations. In this work, AFM tomography is carried out in YbMnO3, mapping its complex domain microstructure up to a depth of ≈1.8 µm along with its current pathways. A model is presented, describing the impact of interconnected domain walls within the network, which act as current dividers and codetermine how currents distribute. Finally, challenges such as tip-blunting and subsurface damage are identified through TEM studies, and strategies to address them are also put forward. This study highlights the potential of AFM tomography and can spur interest within the ferroics community for its use in the investigation of similar material systems.
- Publication status:
- Published
- Peer review status:
- Peer reviewed
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- Files:
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(Preview, Version of record, pdf, 5.3MB, Terms of use)
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- Publisher copy:
- 10.1002/admi.202400813
Authors
- Publisher:
- Wiley
- Journal:
- Advanced Materials Interfaces More from this journal
- Volume:
- 12
- Issue:
- 9
- Article number:
- 2400813
- Publication date:
- 2025-01-15
- Acceptance date:
- 2024-12-23
- DOI:
- EISSN:
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2196-7350
- Language:
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English
- Keywords:
- Pubs id:
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2118959
- Local pid:
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pubs:2118959
- Deposit date:
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2025-04-18
- ARK identifier:
Terms of use
- Copyright holder:
- Sharma et al.
- Copyright date:
- 2025
- Rights statement:
- © 2025 The Author(s). Advanced Materials Interfaces published by Wiley-VCH GmbH This is an open access article under the terms of the Creative Commons Attribution License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited.
- Licence:
- CC Attribution (CC BY)
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