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SPATIALLY AND TEMPORALLY RESOLVED LASER-INDUCED FLUORESCENCE MEASUREMENTS OF CF2 AND CF RADICALS IN A CF4 RF PLASMA

Abstract:
Laser-induced fluorescence has been used to examine the temporal behavior of ground-state CF2 and CF radicals in a CF4 plasma etching reactor. We also report the measured spatial dependencies of the radical concentrations, and develop a rigorous model for their interpretation. The results indicate that for CF2 and CF, wall removal processes are dominant at low pressures of the order of 50 mTorr, and that CF is not produced by electron impact dissociation of CF2.
Publication status:
Published

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Publisher copy:
10.1063/1.343712

Authors

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Institution:
University of Oxford
Division:
MPLS
Department:
Chemistry
Sub department:
Physical & Theoretical Chem
Role:
Author


Journal:
JOURNAL OF APPLIED PHYSICS More from this journal
Volume:
66
Issue:
11
Pages:
5251-5257
Publication date:
1989-12-01
DOI:
ISSN:
0021-8979


Language:
English
Pubs id:
pubs:43136
UUID:
uuid:b1bdf7de-3ab6-4a0c-8ae3-a4a7018fd1ad
Local pid:
pubs:43136
Source identifiers:
43136
Deposit date:
2012-12-19
ARK identifier:

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