Design optimization of MAPS-based detectors using a data-driven fast simulation approach

Journal article

Abstract A parametric simulation tool for pixel sensors is presented. A realistic pixel response is simulated purely based on measurement input, without requiring detailed knowledge of the underlying manufacturing process. As such, it provides an efficient alternative to the use of Technology Computer-Aided Design simulations, which typically depend on proprietary process information. Due to its parametric approach, the package is fast and thus particularly useful for larger detector systems and high hit rate environments. This work presents measurements, simulation and its validation for the MALTA2 sensor. It is a small collection electrode monolithic active pixel sensor produced in the Tower 180 nm complementary metal-oxide-semiconductor imaging process. Modifications to the sensor’s periphery, mainly in the hit merger, are studied in order to optimize the performance for tracking and calorimetry. This optimization is of special interest as part of the MALTA3 sensor redesign in the 65 nm Tower Partners Semiconductor Co. process.

Authors: Berlea, DV; Fasselt, L; Behera, P; Bortoletto, D; Buttar, C

• Publication status: Published
• Peer review status: Peer reviewed
• Publisher: SpringerOpen
• Journal: The European Physical Journal C
• Volume: 86
• Issue: 7
• Article number: 890
• Publication date: 2026-07-28
• DOI: 10.1140/epjc/s10052-026-16147-4
• EISSN: 1434-6052
• ISSN: 1434-6044
• Language: English
• Keywords: Tracking (education); Parametric statistics; Tower; Semiconductor device fabrication; Detector; Pixel; Process (computing)