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Optically Determined Hole Effective Mass in Tin-Iodide Perovskite Films

Abstract:
Tin-halide perovskites currently offer the best photovoltaic performance of lead-free metal-halide semiconductors. However, their transport properties are mostly dominated by holes, owing to ubiquitous self-doping. Here we demonstrate a noncontact, optical spectroscopic method to determine the effective mass of the dominant hole species in FASnI3, by investigating a series of thin films with hole densities finely tuned through either SnF2 additive concentration or controlled exposure to air. We accurately determine the plasma frequency from mid-infrared reflectance spectra by modeling changes in the vibrational response of the FA cation as the plasma edge shifts through the molecular resonance. Our approach yields a hole effective mass of 0.28m e for FASnI3 and demonstrates parabolicity within ∼100 meV of the valence band edge. An absence of Fano contributions further highlights insignificant coupling between the hole plasma and FA cation. Overall, this approach enables noncontact screening of thin-film materials for optimized charge-carrier transport properties.
Publication status:
Published
Peer review status:
Peer reviewed

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Publisher copy:
10.1021/acsenergylett.5c02283

Authors


More by this author
Institution:
University of Oxford
Division:
MPLS
Department:
Physics
Sub department:
Physics - Central
Role:
Author
ORCID:
0000-0002-9726-0436
More by this author
Institution:
University of Oxford
Division:
MPLS
Department:
Physics
Sub department:
Physics - Central
Role:
Author
ORCID:
0000-0001-5507-1445
More by this author
Institution:
University of Oxford
Division:
MPLS
Department:
Physics
Sub department:
Physics - Central
Role:
Author
More by this author
Role:
Author
ORCID:
0000-0003-0157-3233
More by this author
Institution:
University of Oxford
Division:
MPLS
Department:
Physics
Sub department:
Physics - Central
Role:
Author
ORCID:
0000-0001-8511-790X



Publisher:
American Chemical Society
Journal:
ACS Energy Letters More from this journal
Volume:
10
Issue:
9
Pages:
4589-4595
Publication date:
2025-08-28
Acceptance date:
2025-08-20
DOI:
EISSN:
2380-8195
ISSN:
2380-8195


Language:
English
Source identifiers:
3284276
Deposit date:
2025-09-15
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