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Carbon nanotube nanoelectronic devices compatible with transmission electron microscopy

Abstract:

We report on a novel method to fabricate carbon nanotube (CNT) nanoelectronic devices on silicon nitride membrane grids that are compatible with high resolution transmission electron microscopy (HRTEM). Resist-based electron beam lithography is used to fabricate electrodes on 50nm thin silicon nitride membranes and focused-ion-beam milling is used to cut out a 200nm gap across a gold electrode to produce the viewing window for HRTEM. Spin-coating and AC electrophoresis are used as methods to ...

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Journal:
Nanotechnology
Volume:
22
Issue:
24
Publication date:
2011-06-17
DOI:
EISSN:
1361-6528
ISSN:
0957-4484
URN:
uuid:9e644af3-7447-4527-bf13-92ec64c48b6f
Source identifiers:
179155
Local pid:
pubs:179155
Language:
English

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