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Influence of Hydrogen‐Incorporation on the Bulk Electronic Structure and Chemical Bonding in Palladium

Abstract:
Palladium hydride is a model system for studying metal‐hydrogen interactions. Yet, its bulk electronic structure has proven difficult to directly probe, with most studies to date limited to surface‐sensitive photoelectron spectroscopy approaches. This work reports the first in situ ambient‐pressure hard X‐ray photoelectron spectroscopy (AP‐HAXPES) study of hydrogen incorporation in Pd thin films, providing direct access to bulk chemical and electronic information at elevated hydrogen pressures. Structural characterization by in situ X‐ray diffraction and neutron reflectometry under comparable conditions establishes a direct correlation between hydrogen loading, lattice expansion, and electronic modifications. Comparison with density functional theory (DFT) reveals how hydrogen stoichiometry and site occupancy govern the density of occupied states near the Fermi level. These results resolve long‐standing questions regarding PdH and establish AP‐HAXPES as a powerful tool for probing the bulk electronic structure of metal hydrides under realistic conditions.
Publication status:
Published
Peer review status:
Peer reviewed

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Publisher copy:
10.1002/advs.202522098

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Role:
Author
ORCID:
0000-0001-8150-3694
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Role:
Author
ORCID:
0000-0003-4299-3875
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Role:
Author
ORCID:
0000-0002-5297-710X


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Funder identifier:
https://ror.org/01js2sh04


Publisher:
Wiley
Journal:
Advanced Science More from this journal
Article number:
e22098
Publication date:
2026-02-10
Acceptance date:
2026-01-26
DOI:
EISSN:
2198-3844
ISSN:
2198-3844


Language:
English
Keywords:
Pubs id:
2370206
Local pid:
pubs:2370206
Source identifiers:
3744998
Deposit date:
2026-02-10
ARK identifier:
This ORA record was generated from metadata provided by an external service. It has not been edited by the ORA Team.

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