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Dynamics of a thin film driven by a moving pressure source

Abstract:

Motivated by the liquid metal coating on a divertor in a tokamak, we investigate the flow of a thin film of incompressible fluid on an inclined substrate subjected to a localized external pressure that oscillates parallel to the substrate. When the movement of the pressure occurs on a timescale significantly longer than the characteristic time for the thin film to equilibrate, the system is quasisteady. In the opposite extreme, where the pressure oscillates much faster than the response time ...

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Publication status:
Published
Peer review status:
Peer reviewed
Version:
Accepted Manuscript

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Publisher copy:
10.1103/PhysRevFluids.3.114801

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Institution:
University of Oxford
Division:
MPLS Division
Department:
Mathematical Institute
Oxford college:
Mansfield College
More by this author
Institution:
University of Oxford
Division:
MPLS Division
Department:
Mathematical Institute
Publisher:
American Physical Society Publisher's website
Journal:
Physical Review Fluids Journal website
Volume:
3
Issue:
11
Pages:
Article: 114801
Publication date:
2018-11-06
Acceptance date:
2018-10-16
DOI:
ISSN:
2469-990X
Pubs id:
pubs:930467
URN:
uri:8b71e373-28cd-4421-a7ba-859cc649b8e7
UUID:
uuid:8b71e373-28cd-4421-a7ba-859cc649b8e7
Local pid:
pubs:930467

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