Journal article
Large-area plastic nanogap electronics enabled by adhesion lithography
- Abstract:
- Large-area manufacturing of flexible nanoscale electronics has long been sought by the printed electronics industry. However, the lack of a robust, reliable, high throughput and low-cost technique that is capable of delivering high-performance functional devices has hitherto hindered commercial exploitation. Herein we report on the extensive range of capabilities presented by adhesion lithography (a-Lith), an innovative patterning technique for the fabrication of coplanar nanogap electrodes with arbitrarily large aspect ratio. We use this technique to fabricate a plethora of nanoscale electronic devices based on symmetric and asymmetric coplanar electrodes separated by a nanogap ≺ 15 nm. We show that functional devices including self-aligned-gate transistors, radio frequency diodes and rectifying circuits, multi-colour organic light-emitting nanodiodes and multilevel non-volatile memory devices, can be fabricated in a facile manner with minimum process complexity on a range of substrates. The compatibility of the formed nanogap electrodes with a wide range of solution processable semiconductors and substrate materials renders a-Lith highly attractive for the manufacturing of large-area nanoscale opto/electronics on arbitrary size and shape substrates.
- Publication status:
- Published
- Peer review status:
- Peer reviewed
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(Preview, Version of record, pdf, 2.2MB, Terms of use)
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- Publisher copy:
- 10.1038/s41528-018-0031-3
Authors
- Publisher:
- Nature Publishing Group
- Journal:
- npj Flexible Electronics More from this journal
- Volume:
- 2
- Publication date:
- 2018-06-25
- Acceptance date:
- 2018-04-26
- DOI:
- EISSN:
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2397-4621
- Pubs id:
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pubs:857968
- UUID:
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uuid:73bfa315-3c8d-4af8-bd8e-84f51ea82292
- Local pid:
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pubs:857968
- Source identifiers:
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857968
- Deposit date:
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2018-08-29
Terms of use
- Copyright holder:
- Semple et al
- Copyright date:
- 2018
- Notes:
-
© The Author(s) 2018. Open Access This article is licensed under a Creative Commons
Attribution 4.0 International License, which permits use, sharing,
adaptation, distribution and reproduction in any medium or format, as long as you give
appropriate credit to the original author(s) and the source, provide a link to the Creative
Commons license, and indicate if changes were made
- Licence:
- CC Attribution (CC BY)
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