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Fast electrochemical triple-interface processes at boron-doped diamond electrodes

Abstract:

Two important mechanisms for electron transfer processes at boron-doped diamond electrodes involving the oxidation of tetramethylphenylenediamine (TMPD) dissolved in aqueous solution and the oxidation of tetrahexylphenylenediamine (THPD) deposited in the form of microdroplets and immersed into aqueous eletrolyte solution are reported. For TMPD, the first oxidation step in aqueous solution follows the equation: TMPDaqueous ⇌ TMPDaqueous+ + e- Remarkably slow heterogeneous kinetics at a H-plasm...

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Publication status:
Published

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Publisher copy:
10.1007/s100080000122

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Institution:
University of Oxford
Department:
Oxford, MPLS, Chemistry, Physical and Theoretical Chem
Role:
Author
More by this author
Institution:
University of Oxford
Department:
Oxford, MPLS, Chemistry, Physical and Theoretical Chem
Role:
Author
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Journal:
JOURNAL OF SOLID STATE ELECTROCHEMISTRY
Volume:
5
Issue:
2
Pages:
88-93
Publication date:
2001-02-05
DOI:
EISSN:
1433-0768
ISSN:
1432-8488
URN:
uuid:4afb939d-3a48-41db-9ff5-43e6ad899f83
Source identifiers:
37700
Local pid:
pubs:37700

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