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Growth of nanocrystalline diamond films for low field electron emission

Abstract:
Nanocrystalline diamond films have been prepared using a magnetically enhanced RF assisted plasma chemical vapour deposition (CVD) source. Such films show field emission at applied fields below 10 V μm-1. Similar results are obtained using methane-hydrogen and methane-nitrogen gas mixtures, suggesting that the nitrogen promoted enhancement in field emission that has been observed in high quality diamond films does not occur for nanocrystalline layers. The design of the source used is easily scaled up for large area deposition, suggesting that this could be a useful approach for the preparation of nanocrystalline diamond films for practical field emission purposes.
Publication status:
Published

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Publisher copy:
10.1016/S0925-9635(98)00424-5

Authors


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Institution:
University of Oxford
Division:
MPLS
Department:
Chemistry
Sub department:
Physical & Theoretical Chem
Role:
Author


Host title:
DIAMOND AND RELATED MATERIALS
Volume:
8
Issue:
2-5
Pages:
768-771
Publication date:
1999-03-01
DOI:
ISSN:
0925-9635


Keywords:
Pubs id:
pubs:36986
UUID:
uuid:4a2911d5-8b27-4f93-ac33-3a7e0f666597
Local pid:
pubs:36986
Source identifiers:
36986
Deposit date:
2012-12-19

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