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Enhancing conductivity of silver nanowire networks through surface engineering using bidentate rigid ligands

Abstract:
Solution processable metallic nanomaterials present a convenient way to fabricate conductive structures, which are necessary in all electronic devices. However, they tend to require post-treatments to remove the bulky ligands around them to achieve high conductivity. In this work, we present a method to formulate a post-treatment free conductive silver nanowire ink by controlling the type of ligands around the silver nanowires. We found that bidentate ligands with a rigid molecular structure were effective in improving the conductivity of the silver nanowire networks as they could maximize the number of linkages between neighboring nanowires. In addition, DFT calculations also revealed that ligands with good LUMO to silver energy alignment were more effective. Because of these reasons, fumaric acid was found to be the most effective ligand and achieved a large reduction in sheet resistance of 70% or higher depending on the nanowire network density. The concepts elucidated from this study would also be applicable to other solution processable nanomaterials systems such as quantum dots for photovoltaics or LEDs which also require good charge transport being neighboring nanoparticles.
Publication status:
Published
Peer review status:
Peer reviewed

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Publisher copy:
10.1021/acsami.3c15207

Authors


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Role:
Author
ORCID:
0000-0002-8365-9550
More by this author
Institution:
University of Oxford
Division:
MPLS
Department:
Materials
Oxford college:
St Edmund Hall
Role:
Author
ORCID:
0000-0001-9641-4643
More by this author
Institution:
University of Oxford
Division:
MPLS
Department:
Materials
Role:
Author
ORCID:
0000-0002-1843-1269
More by this author
Institution:
University of Oxford
Division:
MPLS
Department:
Materials
Role:
Author
ORCID:
0000-0003-0557-337X


Publisher:
American Chemical Society
Journal:
ACS Applied Materials and Interfaces More from this journal
Volume:
16
Issue:
3
Pages:
4150-4159
Place of publication:
United States
Publication date:
2024-01-10
Acceptance date:
2023-12-18
DOI:
EISSN:
1944-8252
ISSN:
1944-8244
Pmid:
38197866


Language:
English
Keywords:
Pubs id:
1607235
Local pid:
pubs:1607235
Deposit date:
2024-01-30

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