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Infrared properties of ultrathin oxides on Si(100)

Publication status:: Published

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APA Style

Giustino, F., & Pasquarello, A. (2005). Infrared properties of ultrathin oxides on Si(100). MICROELECTRONIC ENGINEERING, 80, 420–423.

MLA Style

Giustino, F., and A. Pasquarello. “Infrared Properties of Ultrathin Oxides on Si(100).” MICROELECTRONIC ENGINEERING, vol. 80, 2005, pp. 420–23.

Chicago Style

Giustino, F, and A Pasquarello. 2005. “Infrared Properties of Ultrathin Oxides on Si(100).” In MICROELECTRONIC ENGINEERING, 80:420–23.
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Publisher copy:: 10.1016/j.mee.2005.04.025

Authors

+ Giustino, F More by this author

Role:: Author

+ Pasquarello, A More by this author

Role:: Author

Host title:: MICROELECTRONIC ENGINEERING
Volume:: 80
Pages:: 420-423
Publication date:: 2005-06-01
DOI:: 10.1016/j.mee.2005.04.025
ISSN:: 0167-9317

Keywords:: dielectric permittivity

infrared spectra

interface

Si/SiO2
Pubs id:: pubs:172990
UUID:: uuid:3605e277-7303-469f-b652-126059a6a563
Local pid:: pubs:172990
Source identifiers:: 172990
Deposit date:: 2012-12-19

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Copyright date:: 2005

Licence:: Terms and Conditions of Use for Oxford University Research Archive

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