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BRITTLE TO DUCTILE TRANSITION IN SILICON.

Abstract:
The brittle to ductile transition in silicon is studied by four-point bend testing of specimens containing controlled flaws. A characteristic increase in fracture stress is observed at the transition temperature which is directly correlated to the generation and motion of dislocations at the crack tip. It seems likely that this mechanism will occur in all brittle solids. The effect of doping upon the temperature of the transition is also investigated. It is found that strongly n-doped specimens have a transition temperature about 15 degree C lower than intrinsic specimens.

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Institution:
University of Oxford
Division:
MPLS
Department:
Materials
Role:
Author


Publisher:
Inst of Ceramics
Journal:
British Ceramic Proceedings More from this journal
Issue:
37
Pages:
267-272
Publication date:
1986-10-01
ISSN:
0268-4373


Language:
English
Pubs id:
pubs:430638
UUID:
uuid:32df67f5-aa2e-469b-9fb9-551b5cc48fac
Local pid:
pubs:430638
Source identifiers:
430638
Deposit date:
2013-11-17
ARK identifier:

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