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Modelling of hydrogen transport in silicon solar cell structures under equilibrium conditions

Abstract:
This paper presents a model for the introduction and redistribution of hydrogen in silicon solar cells at temperatures between 300 and 700 °C based on a second order backwards difference formula evaluated using a single Newton-Raphson iteration. It includes the transport of hydrogen and interactions with impurities such as ionised dopants. The simulations lead to three primary conclusions: (1) hydrogen transport across an n-type emitter is heavily temperature dependent; (2) under equilibrium conditions, hydrogen is largely driven by its charged species, with the switch from a dominance of negatively charged hydrogen (H−) to positively charged hydrogen (H+) within the emitter region critical to significant transport across the junction; and (3) hydrogen transport across n-type emitters is critically dependent upon the doping profile within the emitter, and, in particular, the peak doping concentration. It is also observed that during thermal processes after an initial high temperature step, hydrogen preferentially migrates to the surface of a phosphorous doped emitter, drawing hydrogen out of the p-type bulk. This may play a role in several effects observed during post-firing anneals in relation to the passivation of recombination active defects and even the elimination of hydrogen-related defects in the bulk of silicon solar cells.
Publication status:
Published
Peer review status:
Peer reviewed

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Publisher copy:
10.1063/1.5016854

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Institution:
University of Oxford
Division:
MPLS
Department:
Materials
Role:
Author
More by this author
Institution:
University of Oxford
Division:
MPLS Division
Department:
Materials
Role:
Author
More by this author
Institution:
University of Oxford
Division:
MPLS Division
Department:
Materials
Role:
Author


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Grant:
International
theSupersiliconproject(EP/ M024911/1
Industrial EngagementFund


Publisher:
AIP Publishing
Journal:
Journal of Applied Physics More from this journal
Volume:
123
Issue:
4
Article number:
043108
Publication date:
2018-01-26
Acceptance date:
2018-01-08
DOI:
ISSN:
1089-7550


Pubs id:
pubs:821933
UUID:
uuid:2bfb4268-67df-4382-832b-b8957941034e
Local pid:
pubs:821933
Source identifiers:
821933
Deposit date:
2018-01-31

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