THE INTERACTION OF AZOMETHANE WITH SI(100)

Journal article

The adsorption of azomethane, and azomethane pre-cracked to form methyl and dinitrogen species, on Si(100) has been studied using XPS and thermal desorption techniques. Azomethane adsorbs with appreciable sticking probability at 300 K, most probably producing an adlayer containing a mixture of molecularly adsorbed and partially dissociated species. N = N bond cleavage dominates the partial decomposition process, resulting in the formation and desorption of methylamine and hydrogen cyanide. At...

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Authors: Loh, K; Kingsley, C; Foord, J; Jackman, R

• Publication status: Published
• Publisher: Elsevier
• Journal: SURFACE SCIENCE
• Volume: 341
• Issue: 1-2
• Pages: 92-102
• Publication date: 1995-11-01
• DOI: 10.1016/0039-6028(95)00752-0
• ISSN: 0039-6028
• Language: English
• Keywords: THERMAL DESORPTION; SILICON; CHEMISORPTION; COMPOUND FORMATION; CHEMICAL VAPOR DEPOSITION; MOLECULE SOLID REACTIONS; PHOTOEMISSION