Journal article

Reactive deposition epitaxy of CoSi2 nanostructures on Si(001): Nucleation and growth and evolution of dots during anneal

Publication status:: Published

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APA Style

Goldfarb, I., & Briggs, G. (1999). Reactive deposition epitaxy of CoSi2 nanostructures on Si(001): Nucleation and growth and evolution of dots during anneal. Physical Review B, 60(7), 4800–4809.

MLA Style

Goldfarb, I, and G Briggs. “Reactive Deposition Epitaxy of CoSi2 Nanostructures on Si(001): Nucleation and Growth and Evolution of Dots during Anneal.” Physical Review B, vol. 60, no. 7, 1999, pp. 4800–09.

Chicago Style

Goldfarb, I, and G Briggs. 1999. “Reactive Deposition Epitaxy of CoSi2 Nanostructures on Si(001): Nucleation and Growth and Evolution of Dots during Anneal.” Physical Review B 60 (7): 4800–4809.
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Publisher copy:: 10.1103/PhysRevB.60.4800

Authors

+ Goldfarb, I More by this author

Role:: Author

+ Briggs, G More by this author

Role:: Author

Journal:: Physical Review B More from this journal
Volume:: 60
Issue:: 7
Pages:: 4800-4809
Publication date:: 1999-08-15
DOI:: 10.1103/PhysRevB.60.4800
EISSN:: 1095-3795
ISSN:: 1098-0121

Pubs id:: pubs:174555
UUID:: uuid:176c4f4d-8acc-4f6b-8cb0-6c084e9bbfbf
Local pid:: pubs:174555
Source identifiers:: 174555
Deposit date:: 2012-12-19
ARK identifier:: ark:/29072/ora_176c4f4d8acc4f6b8cb06c084e9bbfbf

Terms of use

Copyright date:: 1999

Licence:: Terms and Conditions of Use for Oxford University Research Archive

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