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Electronic transport in highly conducting Si-doped ZnO thin films prepared by pulsed laser deposition

Abstract:
Highly conducting (ρ = 3.9 × 10-4 Ωcm) and transparent (83%) polycrystalline Si-doped ZnO (SiZO) thin films have been deposited onto borosilicate glass substrates by pulsed laser deposition from (ZnO)1-x(SiO2)x (0 ≤ x ≤ 0.05) ceramic targets prepared using a sol-gel technique. Along with their structural, chemical, and optical properties, the electronic transport within these SiZO samples has been investigated as a function of silicon doping level and temperature. Measurements made between 80 and 350 K reveal an almost temperature-independent carrier concentration consistent with degenerate metallic conduction in all of these samples. The temperature-dependent Hall mobility has been modeled by considering the varying contribution of grain boundary and electron-phonon scattering in samples with different nominal silicon concentrations.
Publication status:
Published
Peer review status:
Peer reviewed

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Files:
Publisher copy:
10.1063/1.4936613

Authors

More by this author
Institution:
University of Oxford
Division:
MPLS
Department:
Chemistry
Sub department:
Inorganic Chemistry
Role:
Author
More by this author
Institution:
University of Oxford
Division:
MPLS
Department:
Chemistry
Sub department:
Inorganic Chemistry
Role:
Author


Publisher:
American Institute of Physics
Journal:
Applied Physics Letters More from this journal
Volume:
107
Issue:
23
Pages:
232103-232103
Publication date:
2015-12-08
Acceptance date:
2015-11-15
DOI:
EISSN:
1077-3118
ISSN:
0003-6951


Pubs id:
pubs:581184
UUID:
uuid:16bbe105-f6b8-45d4-bc91-ed06ef5f6a19
Local pid:
pubs:581184
Source identifiers:
581184
Deposit date:
2016-03-04
ARK identifier:

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