Journal article

ANALYTICAL MODELING OF NONLINEAR DIFFUSION OF ARSENIC IN SILICON

Publication status:: Published

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APA Style

Jeppson, K., Anderson, D., Amaratunga, G., & Please, C. (1987). ANALYTICAL MODELING OF NONLINEAR DIFFUSION OF ARSENIC IN SILICON. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 134(9), 2316–2319.

MLA Style

Jeppson, K, et al. “ANALYTICAL MODELING OF NONLINEAR DIFFUSION OF ARSENIC IN SILICON.” JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 134, no. 9, 1987, pp. 2316–19.

Chicago Style

Jeppson, K, D Anderson, G Amaratunga, and C Please. 1987. “ANALYTICAL MODELING OF NONLINEAR DIFFUSION OF ARSENIC IN SILICON.” JOURNAL OF THE ELECTROCHEMICAL SOCIETY 134 (9): 2316–19.
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Publisher copy:: 10.1149/1.2100877

Authors

+ Jeppson, K More by this author

Role:: Author

+ Anderson, D More by this author

Role:: Author

+ Amaratunga, G More by this author

Role:: Author

+ Please, C More by this author

Role:: Author

Journal:: JOURNAL OF THE ELECTROCHEMICAL SOCIETY More from this journal
Volume:: 134
Issue:: 9
Pages:: 2316-2319
Publication date:: 1987-09-01
DOI:: 10.1149/1.2100877
ISSN:: 0013-4651

Pubs id:: pubs:357683
UUID:: uuid:15cfbc31-0e0c-484a-a064-3ebf164f8648
Local pid:: pubs:357683
Source identifiers:: 357683
Deposit date:: 2013-11-16
ARK identifier:: ark:/29072/ora_15cfbc310e0c484aa0643ebf164f8648

Terms of use

Copyright date:: 1987

Licence:: Terms and Conditions of Use for Oxford University Research Archive

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