Journal article
Surface spectroscopic and molecular beam studies of the reactions of trimethylaluminium on Si(100)
- Abstract:
- The reactions of trimethylaluminium leading to the deposition of Al on Si have been studied using LEED, XPS, AES, TDS and molecular beam scattering. Trimethylaluminium is shown to chemisorb on Si(100) subsequently decomposing to produce CH4(g) and contaminated Al layers. Al catalyses the decomposition reaction and opens up a new reaction channel, resulting in the evolution of C2H2(g).
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- Publisher copy:
- 10.1088/0953-8984/1/SB/025
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Bibliographic Details
- Journal:
- Journal of Physics: Condensed Matter
- Volume:
- 1
- Issue:
- SB
- Pages:
- SB145-SB148
- Publication date:
- 1989-01-01
- DOI:
- EISSN:
-
1361-648X
- ISSN:
-
0953-8984
- Source identifiers:
-
94419
Item Description
- Language:
- English
- Pubs id:
-
pubs:94419
- UUID:
-
uuid:11ac42fa-69bb-4cdb-ad2f-e9d2e0b189ff
- Local pid:
- pubs:94419
- Deposit date:
- 2012-12-20
Terms of use
- Copyright date:
- 1989
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