Journal article icon

Journal article

Deposition of SrZrO3 thin films using liquid delivery metal-organic chemical vapor deposition

Abstract:
Proton-conductive SrZrO3 films were successfully deposited on Pt/SiOx/Si and porous stainless-steel substrates by liquid delivery metalorganic chemical vapor deposition (LD-MOCVD). The as-deposited films deposited on the Pt/SiOx/Si substrate at 600 °C showed good crystallinity and post-annealing at temperatures below 800 °C resulted in improved crystallinity. A 200-nm-thick film deposited on the porous stainless-steel substrate was flat and solid and did not show any gas leakage. We consider this deposition technique to be applicable for the fabrication of a new solid oxide fuel cell structure with intermediate-temperature operation. © 2009 The Japan Society of Applied Physics.

Actions


Access Document


Publisher copy:
10.1143/JJAP.48.070205

Authors



Journal:
Japanese Journal of Applied Physics More from this journal
Volume:
48
Issue:
7 PART 1
Pages:
070205-070205
Publication date:
2009-07-01
DOI:
EISSN:
1347-4065
ISSN:
0021-4922


Language:
English
Pubs id:
pubs:297303
UUID:
uuid:110596b0-3d2c-4d43-9bb9-aa4a3a2c8f7e
Local pid:
pubs:297303
Source identifiers:
297303
Deposit date:
2013-11-17

Terms of use



Views and Downloads






If you are the owner of this record, you can report an update to it here: Report update to this record

TO TOP