Journal article
Deposition of SrZrO3 thin films using liquid delivery metal-organic chemical vapor deposition
- Abstract:
- Proton-conductive SrZrO3 films were successfully deposited on Pt/SiOx/Si and porous stainless-steel substrates by liquid delivery metalorganic chemical vapor deposition (LD-MOCVD). The as-deposited films deposited on the Pt/SiOx/Si substrate at 600 °C showed good crystallinity and post-annealing at temperatures below 800 °C resulted in improved crystallinity. A 200-nm-thick film deposited on the porous stainless-steel substrate was flat and solid and did not show any gas leakage. We consider this deposition technique to be applicable for the fabrication of a new solid oxide fuel cell structure with intermediate-temperature operation. © 2009 The Japan Society of Applied Physics.
Actions
Authors
- Journal:
- Japanese Journal of Applied Physics More from this journal
- Volume:
- 48
- Issue:
- 7 PART 1
- Pages:
- 070205-070205
- Publication date:
- 2009-07-01
- DOI:
- EISSN:
-
1347-4065
- ISSN:
-
0021-4922
- Language:
-
English
- Pubs id:
-
pubs:297303
- UUID:
-
uuid:110596b0-3d2c-4d43-9bb9-aa4a3a2c8f7e
- Local pid:
-
pubs:297303
- Source identifiers:
-
297303
- Deposit date:
-
2013-11-17
Terms of use
- Copyright date:
- 2009
If you are the owner of this record, you can report an update to it here: Report update to this record