Journal article

Control of drop positioning using chemical patterning

Abstract:: We explore how chemical patterning on surfaces can be used to control drop wetting. Both numerical and experimental results are presented to show how the dynamic pathway and equilibrium shape of the drops are altered by a hydrophobic grid. The grid proves a successful way of confining drops and we show that it can be used to alleviate mottle, a degradation in image quality which results from uneven drop coalescence due to randomness in the positions of the drops within the jetted array. © 2005 American Institute of Physics.

Publication status:: Published

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APA Style

Dupuis, A., Leopoldes, J., Bucknall, D., & Yeomans, J. (2005). Control of drop positioning using chemical patterning. APPLIED PHYSICS LETTERS, 87(2), 024103–024103.

MLA Style

Dupuis, A, et al. “Control of Drop Positioning Using Chemical Patterning.” APPLIED PHYSICS LETTERS, vol. 87, no. 2, 2005, pp. 024103–03.

Chicago Style

Dupuis, A, J Leopoldes, D Bucknall, and J Yeomans. 2005. “Control of Drop Positioning Using Chemical Patterning.” APPLIED PHYSICS LETTERS 87 (2): 024103–.
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Publisher copy:: 10.1063/1.1984098

Authors

+ Dupuis, A More by this author

Role:: Author

+ Leopoldes, J More by this author

Role:: Author

+ Bucknall, D More by this author

Role:: Author

+ Yeomans, J More by this author

Institution:: University of Oxford
Division:: MPLS
Department:: Physics
Sub department:: Theoretical Physics
Role:: Author

Journal:: APPLIED PHYSICS LETTERS More from this journal
Volume:: 87
Issue:: 2
Pages:: 024103-024103
Publication date:: 2005-07-11
DOI:: 10.1063/1.1984098
ISSN:: 0003-6951

Language:: English
Pubs id:: pubs:29313
UUID:: uuid:0f882d1e-f5e4-423b-bf64-27a5020c6051
Local pid:: pubs:29313
Source identifiers:: 29313
Deposit date:: 2012-12-19
ARK identifier:: ark:/29072/ora_0f882d1ef5e4423bbf6427a5020c6051

Terms of use

Copyright date:: 2005

Licence:: Terms and Conditions of Use for Oxford University Research Archive

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