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Howard, J. M., et al. “Interfacial Layer Formation during High-Temperature Annealing of ZrO2 Thin Films on Si.” Applied Physics Letters, vol. 81, no. 18, 2002, pp. 3431–33.

Howard, JM, V Craciun, C Essary, RK Singh, and MO Jones. 2002. “Interfacial Layer Formation during High-Temperature Annealing of ZrO2 Thin Films on Si.” Applied Physics Letters 81 (18): 3431–33.