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Journal article

Interfacial layer formation during high-temperature annealing of ZrO2 thin films on Si

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Authors


Howard, JM More by this author
Craciun, V More by this author
Journal:
Applied Physics Letters
Volume:
81
Issue:
18
Pages:
3431-3433
Publication date:
2002
ISSN:
0003-6951
URN:
uuid:0c75c291-7e56-4db3-82fd-b70f67a81ca9
Source identifiers:
118918
Local pid:
pubs:118918

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