Journal article
Interfacial layer formation during high-temperature annealing of ZrO2 thin films on Si
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Bibliographic Details
- Journal:
- Applied Physics Letters
- Volume:
- 81
- Issue:
- 18
- Pages:
- 3431-3433
- Publication date:
- 2002-01-01
- ISSN:
-
0003-6951
- Source identifiers:
-
118918
Item Description
- Pubs id:
-
pubs:118918
- UUID:
-
uuid:0c75c291-7e56-4db3-82fd-b70f67a81ca9
- Local pid:
- pubs:118918
- Deposit date:
- 2013-02-20
Terms of use
- Copyright date:
- 2002
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