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THERMAL AND PHOTOCHEMICAL VAPOR-DEPOSITION OF FE FROM FE(CO)5 ON SI(100)

Abstract:

The adsorption of Fe(CO)5 on Si(100) has been studied using AES and TDS techniques; pyrolytic and photochemical decomposition reactions have been examined. The adsorbate is found to undergo a dissociative, activated adsorption reaction above 300 K resulting in formation of an Fe film in which the carbon and oxygen concentrations are a few atomic percent. The sticking probability associated with the reaction is in the range 10-3-10-4 at 500 K and the apparent activation energy is 26 ± 2 kJ mol...

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Publication status:
Published

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Journal:
SURFACE SCIENCE More from this journal
Volume:
209
Issue:
1-2
Pages:
151-158
Publication date:
1989-02-01
DOI:
ISSN:
0039-6028
Language:
English
Pubs id:
pubs:43239
UUID:
uuid:078d95d4-faf2-444d-8e6f-3012c1ba8bf3
Local pid:
pubs:43239
Source identifiers:
43239
Deposit date:
2012-12-19

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