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The atomic lensing model: new opportunities for atom-by-atom metrology of heterogeneous nanomaterials

Abstract:

The atomic lensing model has been proposed as a promising method facilitating atom-counting in heterogeneous nanocrystals [1]. Here, image simulations will validate the model, which describes dynamical diffraction as a superposition of individual atoms focussing the incident electrons. It will be demonstrated that the model is reliable in the annular dark field regime for crystals having columns containing dozens of atoms. By using the principles of statistical detection theory, it will be sh...

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Publication status:
Published
Peer review status:
Peer reviewed

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Authors


Van Den Bos, KHW More by this author
Janssens, L More by this author
De Backer, A More by this author
More by this author
Institution:
University of Oxford
Division:
MPLS Division
Department:
Materials
Oxford college:
Corpus Christi College
Van Aert, S More by this author
Publisher:
Elsevier Publisher's website
Journal:
Ultramicroscopy Journal website
Volume:
203
Pages:
155-162
Publication date:
2018-12-06
Acceptance date:
2018-12-05
DOI:
EISSN:
1879-2723
ISSN:
0304-3991
Pubs id:
pubs:952867
URN:
uri:06f0a087-43b9-4169-986e-dbbdba618b0d
UUID:
uuid:06f0a087-43b9-4169-986e-dbbdba618b0d
Local pid:
pubs:952867

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