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Saturated and near-diffraction-limited operation of an XUV laser at 23.6 nm

Abstract:

Amplification of spontaneous emission (ASE) at 23.6 nm has been studied in a Ge plasma heated by a 1 TW infrared laser pulse. The exponent of the axial gain reached 21 in a geometry with Fresnel number ≤ 1. Two plasma columns of combined length up to 36 mm were used with an extreme ultraviolet mirror giving double-pass amplification. Saturation of the ASE output was observed. The beam divergence was about 8× diffraction limited with a brightness estimated at 1014 W cm-2sr-1. The feedback from...

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Publisher copy:
10.1103/PhysRevLett.68.2917

Authors


Carillon, A More by this author
Dwivedi, L More by this author
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Journal:
Physical Review Letters
Volume:
68
Issue:
19
Pages:
2917-2920
Publication date:
1992
DOI:
ISSN:
0031-9007
URN:
uuid:06748233-04ad-459c-9535-3311a5fd5937
Source identifiers:
353868
Local pid:
pubs:353868
Language:
English

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