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LASER-INDUCED FLUORESCENCE DETECTION OF CF AND CF2 RADICALS IN A CF4/O2 PLASMA

Abstract:
Laser induced fluorescence has been used to detect ground-state CF and CF2 radicals in a CF4/O2 plasma etching reactor. Measurements are reported of the spatial variation of CF2 concentrations, of the CF radical rotational state distributions, and of the variation of both species with O2 content of the plasma.
Publication status:
Published

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Publisher copy:
10.1063/1.98214

Authors

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Institution:
University of Oxford
Division:
MPLS
Department:
Chemistry
Sub department:
Physical & Theoretical Chem
Role:
Author

Journal:
APPLIED PHYSICS LETTERS More from this journal
Volume:
50
Issue:
6
Pages:
318-319
Publication date:
1987-02-09
DOI:
ISSN:
0003-6951

Language:
English
Pubs id:
pubs:42621
UUID:
uuid:0172e97a-d996-45f6-a96e-e733b2f56dff
Local pid:
pubs:42621
Source identifiers:
42621
Deposit date:
2012-12-19

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