Journal article

FABRICATION OF SUBMICROMETER PARALLELOGRAMIC-SHAPED GRATINGS IN SIO2

Publication status:: Published

Actions

Email

Email this record

Send the bibliographic details of this record to your email address.

Your Email
Please enter the email address that the record information will be sent to.

-
Your message (optional)
Please add any additional information to be included within the email.
Share
Cite

Cite this record

APA Style

Li, M., Lin, J., Cherrill, M., & Sheard, S. (1994). FABRICATION OF SUBMICROMETER PARALLELOGRAMIC-SHAPED GRATINGS IN SIO2. ELECTRONICS LETTERS, 30(25), 2126–2128.

MLA Style

Li, M, et al. “FABRICATION OF SUBMICROMETER PARALLELOGRAMIC-SHAPED GRATINGS IN SIO2.” ELECTRONICS LETTERS, vol. 30, no. 25, 1994, pp. 2126–28.

Chicago Style

Li, M, J Lin, M Cherrill, and S Sheard. 1994. “FABRICATION OF SUBMICROMETER PARALLELOGRAMIC-SHAPED GRATINGS IN SIO2.” ELECTRONICS LETTERS 30 (25): 2126–28.
Print

Access Document

Publisher copy:: 10.1049/el:19941443

Authors

+ Li, M More by this author

Role:: Author

+ Lin, J More by this author

Role:: Author

+ Cherrill, M More by this author

Role:: Author

+ Sheard, S More by this author

Role:: Author

Journal:: ELECTRONICS LETTERS More from this journal
Volume:: 30
Issue:: 25
Pages:: 2126-2128
Publication date:: 1994-12-08
DOI:: 10.1049/el:19941443
EISSN:: 1350-911X
ISSN:: 0013-5194

Keywords:: REACTIVE ION ETCHING

GRATING FILTERS
Pubs id:: pubs:64837
UUID:: uuid:00c6dacc-7117-4515-8a8a-15e109fa9e7a
Local pid:: pubs:64837
Source identifiers:: 64837
Deposit date:: 2012-12-19
ARK identifier:: ark:/29072/ora_00c6dacc711745158a8a15e109fa9e7a

Terms of use

Copyright date:: 1994

Licence:: Terms and Conditions of Use for Oxford University Research Archive

Views and Downloads

About views and downloads

If you are the owner of this record, you can report an update to it here: Report update to this record

TO TOP