Journal article
The effect of pattern overlap on the accuracy of high resolution electron backscatter diffraction measurements.
- Abstract:
- High resolution, cross-correlation-based, electron backscatter diffraction (EBSD) measures the variation of elastic strains and lattice rotations from a reference state. Regions near grain boundaries are often of interest but overlap of patterns from the two grains could reduce accuracy of the cross-correlation analysis. To explore this concern, patterns from the interior of two grains have been mixed to simulate the interaction volume crossing a grain boundary so that the effect on the accuracy of the cross correlation results can be tested. It was found that the accuracy of HR-EBSD strain measurements performed in a FEG-SEM on zirconium remains good until the incident beam is less than 18nm from a grain boundary. A simulated microstructure was used to measure how often pattern overlap occurs at any given EBSD step size, and a simple relation was found linking the probability of overlap with step size.
- Publication status:
- Published
- Peer review status:
- Peer reviewed
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(Preview, pdf, 5.0MB, Terms of use)
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- Publisher copy:
- 10.1016/j.ultramic.2015.04.019
Authors
- Publisher:
- Elsevier
- Journal:
- Ultramicroscopy More from this journal
- Volume:
- 155
- Pages:
- 62-73
- Publication date:
- 2015-08-01
- DOI:
- EISSN:
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1879-2723
- ISSN:
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0304-3991
- Language:
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English
- Keywords:
- Pubs id:
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pubs:523085
- UUID:
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uuid:00bf6606-51d9-4868-ae3c-a48689f16e8c
- Local pid:
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pubs:523085
- Source identifiers:
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523085
- Deposit date:
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2015-07-06
Terms of use
- Copyright holder:
- Tong et al
- Copyright date:
- 2015
- Notes:
- Copyright © 2015 The Authors. Published by Elsevier B.V. This is an open access article under the CC BY-NC-ND license (http://creativecommons.org/licenses/by-nc-nd/4.0/).
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