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Data set for Fabrication of nanoscale features on ultra-thin glass-based dielectrics via self-masking and preferential etching to enhance capacitance

Documentation:
High quality images, schematics and graphs used for publication of the article "Fabrication of nanoscale features on ultra-thin glass-based dielectrics via self-masking and preferential etching to enhance capacitance" are in the sheets from 'Fig 1' to 'Fig 5' of this excel file. The data used to plot the graphs in the article are in the sheet 'All graphs data'.

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Department:
Materials
Role:
Creator

Contributors

Department:
Materials
Role:
Supervisor
Department:
Materials
Role:
Supervisor
More from this funder
Name:
Innovate UK project – Power Electronic Inverters & Capacitors - Future Systems (PEICAP)
Grant:
101664
Publisher:
University of Oxford
Publication date:
2017
UUID:
uuid:f5c6deb5-052e-4265-9c28-c68f0c5bbee5
Deposit date:
2017-08-30

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