Journal article
Direct-write non-linear photolithography for semiconductor nanowire characterization.
- Abstract:
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A practical bottleneck prohibiting the rapid, confident and damage-free electrical contacting of vapour-liquid-solid grown nanowires arises from the random spatial distribution and variation in quality of the nanowires, and the contact dimensions required. Established techniques such as electron-beam lithography or focused ion-beam deposition have challenges in scaling, damage or complexity that can make a large statistical sample difficult. We present a direct laser-writing technique to allo...
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- Publication status:
- Published
- Peer review status:
- Peer reviewed
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- Files:
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(Preview, pdf, 2.8MB, Terms of use)
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- Publisher copy:
- 10.1088/0957-4484/23/33/335704
Authors
Funding
Bibliographic Details
- Publisher:
- IOP Publishing
- Journal:
- Nanotechnology More from this journal
- Volume:
- 23
- Issue:
- 33
- Pages:
- 335704
- Publication date:
- 2012-08-01
- DOI:
- EISSN:
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1361-6528
- ISSN:
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0957-4484
Item Description
- Language:
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English
- Pubs id:
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pubs:423473
- UUID:
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uuid:e607877c-f743-48e4-8fd8-f0f77bc7865a
- Local pid:
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pubs:423473
- Source identifiers:
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423473
- Deposit date:
-
2013-09-26
Terms of use
- Copyright holder:
- IOP Publishing Ltd
- Copyright date:
- 2012
- Notes:
- © 2012 IOP Publishing Ltd.
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