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Direct-write non-linear photolithography for semiconductor nanowire characterization.

Abstract:

A practical bottleneck prohibiting the rapid, confident and damage-free electrical contacting of vapour-liquid-solid grown nanowires arises from the random spatial distribution and variation in quality of the nanowires, and the contact dimensions required. Established techniques such as electron-beam lithography or focused ion-beam deposition have challenges in scaling, damage or complexity that can make a large statistical sample difficult. We present a direct laser-writing technique to allo...

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Publication status:
Published
Peer review status:
Peer reviewed
Version:
Accepted Manuscript

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Files:
Publisher copy:
10.1088/0957-4484/23/33/335704

Authors


Parkinson, P More by this author
Jagadish, C More by this author
Australian National Fabrication Facility More from this funder
Publisher:
IOP Publishing Publisher's website
Journal:
Nanotechnology Journal website
Volume:
23
Issue:
33
Pages:
335704
Publication date:
2012-08-05
DOI:
EISSN:
1361-6528
ISSN:
0957-4484
URN:
uuid:e607877c-f743-48e4-8fd8-f0f77bc7865a
Source identifiers:
423473
Local pid:
pubs:423473
Language:
English

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