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Fabrication and characterisation of Ni nanocontacts

Abstract:
We propose a simple method to make metallic nanocontacts. A gap is electrochemically etched in a Ni track. The gap resistance is monitored as material is redeposited from the solution to bridge the gap. I:V characteristics were compared with those of Ni nanocontacts fabricated using a focussed ion beam (FIB). The I:V characteristic is asymmetric above 200 K in both cases. (C) 2002 Published by Elsevier Science B.V.
Publication status:
Published

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Volume:
242
Issue:
PART I
Pages:
492-494
Publication date:
2002-04-05
DOI:
ISSN:
0304-8853
URN:
uuid:e5976f03-68df-4611-ab84-423b92ed2547
Source identifiers:
15356
Local pid:
pubs:15356

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