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Fabrication of gated polycrystalline silicon field emitters

Abstract:
Polycrystalline silicon is currently being investigated as the cathode material for flat panel displays using field emission. Conventional silicon microfabrication techniques have been adapted to produce highly uniform arrays of gridded polysilicon field emitters.
Publication status:
Published

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Institution:
University of Oxford
Department:
Oxford, MPLS, Materials
Role:
Author
Pages:
367-370
Publication date:
1996-01-01
URN:
uuid:e1cc9a66-f5c0-4b79-84e3-ba90d2acff25
Source identifiers:
10947
Local pid:
pubs:10947
ISBN:
0-7803-3594-5

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