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Electrically conducting, ultra-sharp, high aspect-ratio probes for AFM fabricated by electron-beam-induced deposition of platinum.

Abstract:

We report on the fabrication of electrically conducting, ultra-sharp, high-aspect ratio probes for atomic force microscopy by electron-beam-induced deposition of platinum. Probes of 4.0 ±1.0 nm radius-of-curvature are routinely produced with high repeatability and near-100% yield. Contact-mode topographical imaging of the granular nature of a sputtered gold surface is used to assess the imaging performance of the probes, and the derived power spectral density plots are used to quantify the en...

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Publication status:
Published

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Publisher copy:
10.1016/j.ultramic.2013.05.005

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Institution:
University of Oxford
Division:
MPLS
Department:
Physics
Role:
Author
Journal:
Ultramicroscopy More from this journal
Volume:
133
Pages:
62-66
Publication date:
2013-10-01
DOI:
EISSN:
1879-2723
ISSN:
0304-3991
Language:
English
Keywords:
Pubs id:
pubs:407542
UUID:
uuid:dc252f0a-7f12-4a8e-bfbf-3aab8d275be6
Local pid:
pubs:407542
Source identifiers:
407542
Deposit date:
2013-11-16

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