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Dielectric effect of a thin SiO2 interlayer at the interface between silicon and high-k oxides

Publication status:
Published

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Publisher copy:
10.1016/j.mee.2004.01.011

Authors


Giustino, F More by this author
Pasquarello, A More by this author
Volume:
72
Issue:
1-4
Pages:
299-303
Publication date:
2004-04-05
DOI:
ISSN:
0167-9317
URN:
uuid:d13fa4dd-6ba5-426d-abd8-9f96becad38e
Source identifiers:
173010
Local pid:
pubs:173010

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