- Publication status:
- Published
- Volume:
- 72
- Issue:
- 1-4
- Pages:
- 299-303
- Publication date:
- 2004-04-05
- DOI:
- ISSN:
-
0167-9317
- URN:
-
uuid:d13fa4dd-6ba5-426d-abd8-9f96becad38e
- Source identifiers:
-
173010
- Local pid:
- pubs:173010
- Copyright date:
- 2004
Conference
Dielectric effect of a thin SiO2 interlayer at the interface between silicon and high-k oxides
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