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Thesis

Development, theory and application of the reflection confocal scanning infra-red microscope

Abstract:

Czochralski (Cz) silicon wafers are used almost exclusively for the fabrication of VLSI devices. Such silicon contains excess oxygen which precipitates as oxide particles either when the initial ingot is grown or subsequently during the wafer device fabrication. Such oxide particles can produce reduced device performance or failure if they occur within the active device regions. However, they can be used to improve the device performance by a process known as internal oxide gettering. The...

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Institution:
University of Oxford
Division:
MPLS
Role:
Author

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Role:
Supervisor
Role:
Supervisor
Publication date:
1994
Type of award:
DPhil
Level of award:
Doctoral
Awarding institution:
University of Oxford
Language:
English
Subjects:
UUID:
uuid:cf94a26c-aedc-46cc-b179-542627f59ccd
Local pid:
td:603851147
Source identifiers:
603851147
Deposit date:
2013-10-21

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