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Electron-impact-ionization dynamics of SF6

Abstract:

A detailed understanding of the dissociative electron ionization dynamics of SF6 is important in the modeling and tuning of dry-etching plasmas used in the semiconductor manufacture industry. This paper reports a crossed-beam electron ionization velocity-map imaging study on the dissociative ionization of cold SF6 molecules, providing complete, unbiased kinetic energy distributions for all significant product ions. Analysis of these distributions suggests that fragmentation following single i...

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Publication status:
Published
Peer review status:
Peer reviewed

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Files:
Publisher copy:
10.1103/PhysRevA.96.042704

Authors

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Institution:
University of Oxford
Division:
MPLS Division
Department:
Chemistry; Physical & Theoretical Chem
Role:
Author
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Institution:
University of Oxford
Division:
MPLS
Department:
Chemistry
Sub department:
Physical & Theoretical Chem
Oxford college:
Hertford College
Role:
Author
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Grant:
Starting Independent Researcher Grant No. 200733
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Grant:
Marie Curie Initial Training Network 238671 “ICONIC,”
Publisher:
American Physical Society Publisher's website
Journal:
Physical Review A Journal website
Volume:
96
Issue:
4
Article number:
042704
Publication date:
2017-10-11
Acceptance date:
2017-09-22
DOI:
EISSN:
2469-9934
ISSN:
2469-9926
Pubs id:
pubs:738302
UUID:
uuid:cd1b0eb3-f526-4c9c-85ad-98c87b7e3690
Local pid:
pubs:738302
Source identifiers:
738302
Deposit date:
2017-10-28

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