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APPLICATIONS OF SURFACE SENSITIVE TECHNIQUES IN THE STUDY OF PHOTOCHEMICAL PROCESSING AT THE SOLID-GAS INTERFACE.

Abstract:
The applications of surface sensitive techniques to chemical problems arising in photochemical processing are considered. Both their use in ex situ and in situ modes are described. Results for three photochemical processes are presented dealing with the chemical origins of periodic ripples in LCVD deposits, W metallisation from WF//6 vapour and photo-enhanced etching.

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Authors


Jackman, RB More by this author
More by this author
Institution:
University of Oxford
Department:
Oxford, MPLS, Chemistry, Physical and Theoretical Chem
Publisher:
Les Editions de Physique
Pages:
37-47
Publication date:
1986
URN:
uuid:c67d1fb4-ddd8-47a0-a7f7-a160b65d05c7
Source identifiers:
327052
Local pid:
pubs:327052
Language:
English

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