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APPLICATIONS OF SURFACE SENSITIVE TECHNIQUES IN THE STUDY OF PHOTOCHEMICAL PROCESSING AT THE SOLID-GAS INTERFACE.

Abstract:
The applications of surface sensitive techniques to chemical problems arising in photochemical processing are considered. Both their use in ex situ and in situ modes are described. Results for three photochemical processes are presented dealing with the chemical origins of periodic ripples in LCVD deposits, W metallisation from WF//6 vapour and photo-enhanced etching.

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Institution:
University of Oxford
Division:
MPLS
Department:
Chemistry
Sub department:
Physical & Theoretical Chem
Role:
Author
Publisher:
Les Editions de Physique
Pages:
37-47
Publication date:
1986-01-01
Source identifiers:
327052
Language:
English
Pubs id:
pubs:327052
UUID:
uuid:c67d1fb4-ddd8-47a0-a7f7-a160b65d05c7
Local pid:
pubs:327052
Deposit date:
2013-02-20

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