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Ultrafast laser writing quill effect in low loss waveguide fabrication regime

Abstract:

The quill effect is a laser writing phenomenon in which different fabrication effects occur, depending upon the direction of laser translation. It has not yet, to our knowledge, been studied in the low-loss-waveguide (LLW) writing regime, probably due to its very weak visibility under conventional transmission microscope in that regime. In this report, with the help of adaptive third harmonic generation microscopy, we reveal the quill effect in the LLW writing regime and show its influences ...

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Publication status:
Published
Peer review status:
Peer reviewed
Version:
Publisher's Version

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Publisher copy:
10.1364/OE.26.030716

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More by this author
Institution:
University of Oxford
Division:
MPLS Division
Department:
Engineering Science
Role:
Author
More by this author
Institution:
University of Oxford
Division:
MPLS Division
Department:
Engineering Science
Role:
Author
More by this author
Institution:
University of Oxford
Division:
MPLS Division
Department:
Engineering Science
Oxford college:
Jesus College
Role:
Author
Publisher:
Optical Society of America Publisher's website
Journal:
Optics Express Journal website
Volume:
26
Issue:
23
Pages:
29600-31054
Publication date:
2018-11-12
Acceptance date:
2018-10-22
DOI:
EISSN:
1094-4087
Pubs id:
pubs:934716
URN:
uri:c1397d95-eb8c-4e32-988d-c3ab1f5b6ab8
UUID:
uuid:c1397d95-eb8c-4e32-988d-c3ab1f5b6ab8
Local pid:
pubs:934716

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